Random telegraph signal noise in gate-all-around silicon nanowire transistors featuring Coulomb-blockade characteristics

被引:25
作者
Zhuge, Jing [1 ]
Zhang, Liangliang [1 ]
Wang, Runsheng [1 ]
Huang, Ru [1 ]
Kim, Dong-Won [2 ]
Park, Donggun [2 ]
Wang, Yangyuan [1 ]
机构
[1] Peking Univ, Inst Microelect, Beijing 100871, Peoples R China
[2] Samsung Elect Co, Device Res Team, Kyonggi Do 449711, South Korea
基金
中国国家自然科学基金;
关键词
Coulomb blockade; elemental semiconductors; field effect transistors; nanoelectronics; nanowires; semiconductor device noise; silicon; FIELD-EFFECT TRANSISTORS; SIMULATION; DECANANOMETER; MOSFETS; ENERGY;
D O I
10.1063/1.3089240
中图分类号
O59 [应用物理学];
学科分类号
摘要
Random telegraph signal (RTS) noise is experimentally investigated in silicon nanowire transistors (SNWTs) fabricated with complementary-metal-oxide-semiconductor compatible top-down approach. The observed RTS is found to have Coulomb-blockade characteristics rather than those described by conventional Shockley-Read-Hall theory. The capture and emission time constants of oxide traps strongly depend on the gate bias due to strong quantum confinement and enhanced electrical field in nanowire structures. Amplitude of single RTS in SNWTs is found within 10%, while large amplitude of multilevel RTS up to 34% at room temperature is observed due to the ultranarrow channel and the behavior of independent multitraps in SNWTs. Widely spread time constants of oxide traps and slow RTS of very long-time constants (several hundred seconds) are also observed in SNWTs.
引用
收藏
页数:3
相关论文
共 18 条
[1]  
[Anonymous], 2005, TCAD SENT DEV US MAN
[2]   Simulation of intrinsic parameter fluctuations in decananometer and nanometer-scale MOSFETs [J].
Asenov, A ;
Brown, AR ;
Davies, JH ;
Kaya, S ;
Slavcheva, G .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2003, 50 (09) :1837-1852
[3]   RTS amplitudes in decananometer MOSFETs: 3-D Simulation Study [J].
Asenov, A ;
Balasubramaniam, R ;
Brown, AR ;
Davies, JH .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2003, 50 (03) :839-845
[4]   Probing a nonuniform two-dimensional electron gas with random telegraph signals [J].
Chen, Ming-Jer ;
Lee, Chien-Chih ;
Lu, Ming-Pei .
JOURNAL OF APPLIED PHYSICS, 2008, 103 (03)
[5]   Macroscopic simulation of quantum mechanical effects in 2-D MOS devices via the density gradient method [J].
Connelly, D ;
Yu, ZP ;
Yergeau, D .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2002, 49 (04) :619-626
[6]   High performance silicon nanowire field effect transistors [J].
Cui, Y ;
Zhong, ZH ;
Wang, DL ;
Wang, WU ;
Lieber, CM .
NANO LETTERS, 2003, 3 (02) :149-152
[7]   NOISE IN SOLID-STATE MICROSTRUCTURES - A NEW PERSPECTIVE ON INDIVIDUAL DEFECTS, INTERFACE STATES AND LOW-FREQUENCY (1/F) NOISE [J].
KIRTON, MJ ;
UREN, MJ .
ADVANCES IN PHYSICS, 1989, 38 (04) :367-468
[8]   Impact of the free electron distribution on the random telegraph signal capture kinetics in submicron n-metal-oxide-semiconductor field-effect transistors [J].
Lukyanchikova, NB ;
Petrichuk, MV ;
Garbar, NP ;
Simoen, E ;
Claeys, A .
APPLIED PHYSICS LETTERS, 1998, 73 (17) :2444-2446
[9]   EVALUATION OF THE COULOMB ENERGY FOR SINGLE-ELECTRON INTERFACE TRAPPING IN SUB-MU-M METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS [J].
MUELLER, HH ;
WORLE, D ;
SCHULZ, M .
JOURNAL OF APPLIED PHYSICS, 1994, 75 (06) :2970-2979
[10]   Random telegraph signal: An atomic probe of the local current in field-effect transistors [J].
Mueller, HH ;
Schulz, M .
JOURNAL OF APPLIED PHYSICS, 1998, 83 (03) :1734-1741