Copper pillar interconnect capability for mmwave applications in 3D integration technology

被引:18
作者
Joblot, S. [1 ]
Bar, P. [1 ]
Sibuet, H. [2 ]
Ferrandon, C. [2 ]
Reig, B. [2 ]
Jan, S. [1 ]
Arnaud, C. [1 ]
Lamy, Y. [2 ]
Coudrain, P. [1 ]
Coffy, R. [3 ]
Boillon, O. [3 ]
Carpentier, J. F. [1 ]
机构
[1] STMicroelect, F-38926 Crolles, France
[2] CEA, LETI, F-38054 Grenoble 9, France
[3] STMicroelect, F-38000 Grenoble, France
关键词
Copper pillar; Mmwave; Interconnections; Si interposer; Underfill; Die aspect ratio; COPLANAR WAVE-GUIDES; LOW-LOSS CPW; SILICON; MECHANISMS; LINES;
D O I
10.1016/j.mee.2012.10.024
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
3D integration technology opens the way of heterogeneous silicon platform, as for example, millimeter-wave functionalities could be integrated in future communication modules. Consequently, copper pillar technology realized at 1st level of interconnection between silicon top dies and silicon interposer must be evaluated in this new frequency range. In this paper, a test vehicle has been designed to assess radio frequency behavior of 3D stacking as insertion losses (IL) up to 40 GHz induce by copper pillar interconnection and assembly parameters (pitch, underfilling,...). Copper pillar ground-signal-ground (GSG) vertical transition exhibits IL lower than 0.2 dB at 40 GHz on high resistive silicon substrate and seems to be the minor contributor of all 3D interconnections as TSV, and RDL. Capillary underfill and GSG transition pitch have been evaluated to have a weak impact. Cu ring designed to limit bleed-out and fillet assures PAD integrity and induces a strong signal reflection above 15 GHz. Finally, process assembly robustness of high aspect ratio top die (10 x 3 mm(2)) has been assessed with DC measurements. (c) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:72 / 79
页数:8
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