Recent Trends in Applying Ortho-Nitrobenzyl Esters for the Design of Photo-Responsive Polymer Networks

被引:59
作者
Romano, Angelo [1 ]
Roppolo, Ignazio [1 ]
Rossegger, Elisabeth [2 ]
Schloegl, Sandra [2 ]
Sangermano, Marco [1 ]
机构
[1] Politecn Torino, Dept Appl Sci & Technol, Corso Duca Abruzzi 24, I-10129 Turin, Italy
[2] Polymer Competence Ctr Leoben GmbH, Roseggerstr 12, A-8700 Leoben, Austria
关键词
ortho-nitrobenzyl ester; stimuli responsive polymers; smart coatings; light responsive coatings; photopatterning; PHOTOREMOVABLE PROTECTING GROUPS; AMPHIPHILIC BLOCK-COPOLYMER; REACTION-MECHANISMS; INTRAMOLECULAR SENSITIZATION; LITHOGRAPHIC EVALUATION; WATER DROPLETS; LIGHT; CHEMISTRY; RELEASE; SURFACE;
D O I
10.3390/ma13122777
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Polymers with light-responsive groups have gained increased attention in the design of functional materials, as they allow changes in polymers properties, on demand, and simply by light exposure. For the synthesis of polymers and polymer networks with photolabile properties, the introduction o-nitrobenzyl alcohol (o-NB) derivatives as light-responsive chromophores has become a convenient and powerful route. Although o-NB groups were successfully exploited in numerous applications, this review pays particular attention to the studies in which they were included as photo-responsive moieties in thin polymer films and functional polymer coatings. The review is divided into four different sections according to the chemical structure of the polymer networks: (i) acrylate and methacrylate; (ii) thiol-click; (iii) epoxy; and (iv) polydimethylsiloxane. We conclude with an outlook of the present challenges and future perspectives of the versatile and unique features of o-NB chemistry.
引用
收藏
页码:1 / 26
页数:26
相关论文
共 138 条
[1]   Stimuli-responsive Polyelectrolyte Multilayers for fabrication of self-healing coatings - A review [J].
Abu-Thabit, Nedal Y. ;
Hamdy, Abdel Salam .
SURFACE & COATINGS TECHNOLOGY, 2016, 303 :406-424
[2]   Self-assembly of block copolymer thin films [J].
Albert, Julie N. L. ;
Epps, Thomas H., III .
MATERIALS TODAY, 2010, 13 (06) :24-33
[3]   Distortion of Ultrathin Photocleavable Block Copolymer Films during Photocleavage and Nanopore Formation [J].
Altinpinar, Sedakat ;
Zhao, Hui ;
Ali, Wael ;
Kappes, Ralf S. ;
Schuchardt, Patrick ;
Salehi, Sahar ;
Santoro, Gonzalo ;
Theato, Patrick ;
Roth, Stephan V. ;
Gutmann, Jochen S. .
LANGMUIR, 2015, 31 (32) :8947-8952
[4]  
AMIT B, 1974, ISRAEL J CHEM, V12, P103
[5]   Photoinduced Modulation of Polymeric Interfacial Behavior Controlling Thin-Film Block Copolymer Wetting [J].
An, Sol ;
Kim, Heein ;
Kim, Myungwoong ;
Kim, Sangwon .
LANGMUIR, 2020, 36 (12) :3046-3056
[6]   Layer-by-layer assembly as a versatile bottom-up nanofabrication technique for exploratory research and realistic application [J].
Ariga, Katsuhiko ;
Hill, Jonathan P. ;
Ji, Qingmin .
PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2007, 9 (19) :2319-2340
[7]   UV-Sensitive Self-Assembled Monolayer Photoresist for the Selective Deposition of Carbon Nanotubes [J].
Bardecker, Julie A. ;
Afzali, Ali ;
Tulevski, George S. ;
Graham, Teresita ;
Hannon, James B. ;
Jen, Alex K-Y .
CHEMISTRY OF MATERIALS, 2012, 24 (11) :2017-2021
[8]  
Bargon J., 1984, P INT S METH MAT MIC, P214
[9]   PHOTOSENSITIVE PROTECTIVE GROUPS [J].
BARLTROP, JA ;
PLANT, PJ ;
SCHOFIELD, P .
CHEMICAL COMMUNICATIONS, 1966, (22) :822-+
[10]   Two in One: Light as a Tool for 3D Printing and Erasing at the Microscale [J].
Batchelor, Rhiannon ;
Messer, Tobias ;
Hippler, Marc ;
Wegener, Martin ;
Barner-Kowollik, Christopher ;
Blasco, Eva .
ADVANCED MATERIALS, 2019, 31 (40)