Electron density measurement of cesium seeded negative ion source by surface wave probe

被引：8

作者：

Kisaki, M. ^{[1
]}

Tsumori, K. ^{[1
]}

Nakano, H. ^{[1
]}

Ikeda, K. ^{[1
]}

Osakabe, M. ^{[1
]}

Nagaoka, K. ^{[1
]}

Shibuya, M. ^{[1
]}

Sato, M. ^{[1
]}

Sekiguchi, H. ^{[1
]}

Komada, S. ^{[1
]}

Kondo, T. ^{[1
]}

Hayashi, H. ^{[1
]}

Asano, E. ^{[1
]}

Takeiri, Y. ^{[1
]}

Kaneko, O. ^{[1
]}

机构：

[1] Natl Inst Nat Sci, Natl Inst Fus Sci, Toki, Gifu 5095292, Japan

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 2012年 / 83卷 / 02期

关键词：

PLASMA ABSORPTION PROBE;

D O I：

10.1063/1.3671745

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Electron density measurements of a large-scaled negative ion source were carried out with a surface wave probe. By comparison of the electron densities determined with the surface wave probe and a Langmuir probe, it was confirmed that the surface wave probe is highly available for diagnostic of the electron density in H- ion sources. In addition, it was found that the ratio of the electron density to the H- ion density dramatically decreases with increase of a bias voltage and the H- ions become dominant negative particles at the bias voltage of more than 6 V. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3671745]

引用

页数：4

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