Photoacid and photobase generators: Chemistry and applications to polymeric materials

被引：188
作者：
Shirai, M [1 ]
Tsunooka, M [1 ]
机构：
[1] UNIV OSAKA PREFECTURE, COLL ENGN, DEPT APPL CHEM, SAKAI, OSAKA 593, JAPAN
来源：
PROGRESS IN POLYMER SCIENCE | 1996年 / 21卷 / 01期
关键词：
PHOTOINITIATED CATIONIC POLYMERIZATION; ELECTROPHILIC AROMATIC-SUBSTITUTION; PROPENYL ETHER MONOMERS; TETRAHYDROPYRANYL PROTECTING GROUP; DEVELOPING RESIST MATERIALS; CHEMICAL VAPOR-DEPOSITION; POSITIVE-TYPE PHOTORESIST; LASER FLASH-PHOTOLYSIS; IMINO SULFONATE GROUPS; PENDENT AMINO-GROUPS;
D O I：
10.1016/0079-6700(95)00014-3
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
[No abstract available]
引用
收藏
页码：1 / 45
页数：45
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