Novel organosilicate polymer resists for high resolution E-beam lithography

被引：0
|
作者：
Yoon, Do Y. [1 ]
Sim, Jae Hwan [1 ]
Lee, Sung-Il [1 ]
Lee, Hae-Jeong [2 ]
Kasica, Richard [2 ]
Soles, Christopher L. [2 ]
Kim, Hyun-Mi [3 ]
Kim, Ki-Bum [3 ]
机构：
[1] Seoul Natl Univ, Dept Chem, Seoul, South Korea
[2] NIST, Gaitehrsburg, MD 20899 USA
[3] Seoul Natl Univ, Dept Mat Sci & Engn, Seoul, South Korea
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2012年 / 243卷
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D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
21-PMSE
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页数：1
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