Radial and axial impurity distribution in high-purity germanium crystals

被引:9
作者
Yang, Gang [1 ]
Wang, Guojian [1 ]
Xiang, Wenchang [1 ]
Guan, Yutong [1 ]
Sun, Yongchen [1 ]
Mei, Dongming [1 ]
Gray, Bruce [2 ]
Chan, Yuen-Dat [3 ]
机构
[1] Univ S Dakota, Dept Phys, Vermillion, SD 57069 USA
[2] Univ S Dakota, Dept Chem, Vermillion, SD 57069 USA
[3] Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA
关键词
High Purity Germanium crystal; Carrier concentration; Hall effect; Mobility; Resistivity;
D O I
10.1016/j.jcrysgro.2011.12.042
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
To grow high purity germanium (HPGe) crystals in an underground environment for ultra-low background experiments is being studied. In the present work, HPGe crystals along < 100 > direction have been grown by the Czochralski method. In order to investigate the distribution of the impurities as a function of length for a grown crystal, i.e. the axial direction, we fabricated a system to measure the resistivity along the axial direction at both room temperature and liquid nitrogen temperature. The distribution of the impurities along the radial direction was measured with a Hall Effect System. The results show that the carrier concentration in some crystals grown in a hydrogen atmosphere has an impurity level of about 10(10)/cm(3), which meets the requirements of detector-grade crystals. Published by Elsevier B.V.
引用
收藏
页码:43 / 46
页数:4
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