Modeling Proton Irradiation in AlGaN/GaN HEMTs: Understanding the Increase of Critical Voltage

被引:36
作者
Patrick, Erin [1 ]
Law, Mark E. [1 ]
Liu, Lu [2 ]
Cuervo, Camilo Velez [2 ]
Xi, Yuyin [2 ]
Ren, Fan [2 ]
Pearton, Stephen J. [3 ]
机构
[1] Univ Florida, Dept Elect & Comp Engn, Gainesville, FL 32611 USA
[2] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA
[3] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
关键词
AlGaN/GaN HEMT reliability; critical voltage; radiation effects; semiconductor device simulation; ELECTRON-MOBILITY TRANSISTORS; GAN; DEGRADATION; DEFECTS;
D O I
10.1109/TNS.2013.2286115
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A combination of TRIM and FLOODS models the effect of radiation damage on AlGaN/GaN HEMTs. While excellent fits are obtained for threshold voltage shift, the models do not fully explain the increased reliability observed experimentally. In short, the addition of negatively-charged traps in the GaN buffer layer does not significantly change the electric field at the gate edges at radiation fluence levels seen in this study. We propose that negative trapped charge at the nitride/AlGaN interface actually produces the virtual-gate effect that results in decreasing the magnitude of the electric field at the gate edges and thus the increase in critical voltage. Simulation results including nitride interface charge show significant changes in electric field profiles while the I-V device characteristics do not change.
引用
收藏
页码:4103 / 4108
页数:6
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