The amorphous to face-centered cubic (fcc) and fcc to hexagonal close-packed (hcp) crystallization temperatures of GeSbTe thin films on underlying silicon nitride and silicon dioxide films were studied through slow(1 K/min) resistance versus temperature measurements. The amorphous to fcc phase transition is observed at similar to 170 degrees C for both cases but the fcc to hcp phase transition temperature for GeSbTe films on silicon nitride is observed to be similar to 80 degrees C lower than for GeSbTe films on silicon dioxide, possibly due to the hexagonal symmetry of silicon nitride. (C) 2013 Elsevier B.V. All rights reserved.
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Nagaoka Univ Technol, Extreme Energy Dent Res Inst, Nagoaka 9402188, JapanNagaoka Univ Technol, Extreme Energy Dent Res Inst, Nagoaka 9402188, Japan
Ohori, Tetsutaro
Shirahata, Jun
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Nagaoka Univ Technol, Extreme Energy Dent Res Inst, Nagoaka 9402188, JapanNagaoka Univ Technol, Extreme Energy Dent Res Inst, Nagoaka 9402188, Japan
Shirahata, Jun
Asami, Hiroki
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Nagaoka Univ Technol, Extreme Energy Dent Res Inst, Nagoaka 9402188, JapanNagaoka Univ Technol, Extreme Energy Dent Res Inst, Nagoaka 9402188, Japan
Asami, Hiroki
Suzuki, Tsuneo
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Nagaoka Univ Technol, Extreme Energy Dent Res Inst, Nagoaka 9402188, JapanNagaoka Univ Technol, Extreme Energy Dent Res Inst, Nagoaka 9402188, Japan
Suzuki, Tsuneo
Nakayama, Tadachika
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Nagaoka Univ Technol, Extreme Energy Dent Res Inst, Nagoaka 9402188, JapanNagaoka Univ Technol, Extreme Energy Dent Res Inst, Nagoaka 9402188, Japan
Nakayama, Tadachika
Suematsu, Hisayuki
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Nagaoka Univ Technol, Extreme Energy Dent Res Inst, Nagoaka 9402188, JapanNagaoka Univ Technol, Extreme Energy Dent Res Inst, Nagoaka 9402188, Japan
Suematsu, Hisayuki
Niihara, Koichi
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Nagaoka Univ Technol, Extreme Energy Dent Res Inst, Nagoaka 9402188, JapanNagaoka Univ Technol, Extreme Energy Dent Res Inst, Nagoaka 9402188, Japan
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CNR, Ist Microelettron & Microsistemi, Zona Ind 8 Str 5, I-95121 Catania, ItalyCNR, Ist Microelettron & Microsistemi, Zona Ind 8 Str 5, I-95121 Catania, Italy
Mio, Antonio M.
Privitera, Stefania M. S.
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CNR, Ist Microelettron & Microsistemi, Zona Ind 8 Str 5, I-95121 Catania, ItalyCNR, Ist Microelettron & Microsistemi, Zona Ind 8 Str 5, I-95121 Catania, Italy
Privitera, Stefania M. S.
Bragaglia, Valeria
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Paul Drude Inst Festkorperelekt, Hausvogteipl 5-7, D-10117 Berlin, GermanyCNR, Ist Microelettron & Microsistemi, Zona Ind 8 Str 5, I-95121 Catania, Italy
Bragaglia, Valeria
Arciprete, Fabrizio
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Paul Drude Inst Festkorperelekt, Hausvogteipl 5-7, D-10117 Berlin, Germany
Univ Roma Tor Vergata, Dipartimento Fis, Via Ric Sci 1, I-00133 Rome, ItalyCNR, Ist Microelettron & Microsistemi, Zona Ind 8 Str 5, I-95121 Catania, Italy
Arciprete, Fabrizio
Bongiorno, Corrado
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CNR, Ist Microelettron & Microsistemi, Zona Ind 8 Str 5, I-95121 Catania, ItalyCNR, Ist Microelettron & Microsistemi, Zona Ind 8 Str 5, I-95121 Catania, Italy
Bongiorno, Corrado
Calarco, Raffaella
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Paul Drude Inst Festkorperelekt, Hausvogteipl 5-7, D-10117 Berlin, GermanyCNR, Ist Microelettron & Microsistemi, Zona Ind 8 Str 5, I-95121 Catania, Italy
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Kyungpook Natl Univ, Dept Phys, Taegu 702701, South KoreaKyungpook Natl Univ, Dept Phys, Taegu 702701, South Korea
Kim, Maengjun
Kim, Hongtak
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Yeungnam Univ, Sch Display & Chem Eng, Kyongsan 712749, South KoreaKyungpook Natl Univ, Dept Phys, Taegu 702701, South Korea
Kim, Hongtak
Lee, Sungho
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Kyungpook Natl Univ, Dept Phys, Taegu 702701, South Korea
Kyungwoon Univ, Dept Mat & Energy Engn, Gumi 730739, Gyeongbuk, South KoreaKyungpook Natl Univ, Dept Phys, Taegu 702701, South Korea
Lee, Sungho
Sohn, Sangho
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Kyungpook Natl Univ, Dept Phys, Taegu 702701, South KoreaKyungpook Natl Univ, Dept Phys, Taegu 702701, South Korea