Temperature-dependent current-voltage characteristics and reverse leakage conduction mechanism of Pt/n-type Si0.85Ge0.15 schottky rectifiers

被引:3
作者
Janardhanam, V. [1 ]
Choi, Chel-Jong [1 ]
Lee, Hoon-Ki [2 ]
Kil, Yeon-Ho [2 ]
Shim, Kyu-Hwan [2 ]
Ahn, Kwang-Soon [3 ]
机构
[1] Chonbuk Natl Univ, Dept BIN Fus Technol, Jeonju 561756, South Korea
[2] Chonbuk Natl Univ, Sch Semicond & Chem Engn, Phys Res Ctr, Jeonju 561756, South Korea
[3] Yeungnam Univ, Sch Chem Engn, Gyongsan 712749, South Korea
基金
新加坡国家研究基金会;
关键词
Temperature-dependent I-V characteristics; Schottky emission; SiGe; Schottky contacts; MOLECULAR-BEAM EPITAXY; BARRIER HEIGHTS; DIODE; EXTRACTION; TRANSISTOR; TRANSPORT; JUNCTIONS; CONTACTS;
D O I
10.3938/jkps.60.1498
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We investigated the temperature dependence of the current-voltage (I-V) characteristics and the reverse leakage conduction mechanism of Pt Schottky contacts on n-type Si0.85Ge0.15 measured in the temperature range of 300-450 K. With increasing temperature, the Schottky barrier height and the ideality factor increased and decreased, respectively. The effective barrier height, extracted from a Richardson plot of the saturation current, was found to be 0.61 eV. A spatially inhomogeneous nature of the Pt/on n-type Si0.85Ge0.15 Schottky contact could be the main cause of the temperature dependence of the barrier height, the ideality factor, and the series resistance. The electric field dependence of the reverse leakage current showed that Schottky emission was the dominant mechanism in the reverse leakage current for all temperatures considered.
引用
收藏
页码:1498 / 1503
页数:6
相关论文
共 22 条
[1]   Current transport in Pd2Si/n-Si(100) Schottky barrier diodes at low temperatures [J].
Chand, S ;
Kumar, J .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1996, 63 (02) :171-178
[2]   A transistor performance figure-of-merit including the effect of gate resistance and its application to scaling to sub-0.25-μm CMOS logic technologies [J].
Chatterjee, A ;
Rodder, M ;
Chen, IC .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1998, 45 (06) :1246-1252
[3]   EXTRACTION OF SCHOTTKY DIODE PARAMETERS FROM FORWARD CURRENT-VOLTAGE CHARACTERISTICS [J].
CHEUNG, SK ;
CHEUNG, NW .
APPLIED PHYSICS LETTERS, 1986, 49 (02) :85-87
[4]   THE N-CHANNEL SIGE/SI MODULATION-DOPED FIELD-EFFECT TRANSISTOR [J].
DAEMBKES, H ;
HERZOG, HJ ;
JORKE, H ;
KIBBEL, H ;
KASPAR, E .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1986, 33 (05) :633-638
[5]   Temperature dependent barrier characteristics of CrNiCo alloy Schottky contacts on n-type molecular-beam epitaxy GaAs [J].
Gümüs, A ;
Türüt, A ;
Yalçin, N .
JOURNAL OF APPLIED PHYSICS, 2002, 91 (01) :245-250
[6]  
HAN CH, 1991, IEEE ELECTR DEVICE L, V12, P74, DOI 10.1109/55.75708
[7]   Influence of high-temperature GaN annealed surface on the electrical properties of Ni/GaN Schottky contacts [J].
Iucolano, Ferdinando ;
Roccaforte, Fabrizio ;
Giannazzo, Filippo ;
Raineri, Vito .
JOURNAL OF APPLIED PHYSICS, 2008, 104 (09)
[8]   HETEROJUNCTION BIPOLAR-TRANSISTORS USING SI-GE ALLOYS [J].
IYER, SS ;
PATTON, GL ;
STORK, JMC ;
MEYERSON, BS ;
HARAME, DL .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1989, 36 (10) :2043-2064
[9]   Temperature dependency and carrier transport mechanisms of Ti/p-type InP Schottky rectifiers [J].
Janardhanam, V. ;
Lee, Hoon-Ki ;
Shim, Kyu-Hwan ;
Hong, Hyo-Bong ;
Lee, Soo-Hyung ;
Ahn, Kwang-Soon ;
Choi, Chel-Jong .
JOURNAL OF ALLOYS AND COMPOUNDS, 2010, 504 (01) :146-150
[10]   Characterization of erbium-silicided Schottky diode junction [J].
Jang, M ;
Kim, Y ;
Shin, J ;
Lee, S .
IEEE ELECTRON DEVICE LETTERS, 2005, 26 (06) :354-356