Investigation of the influence of the aberration induced by a plane interface on STED microscopy

被引：47
作者：
Deng, Suhui [1 ,2 ]
Liu, Li [1 ]
Cheng, Ya [1 ]
Li, Ruxin [1 ]
Xu, Zhizhan [1 ]
机构：
[1] Chinese Acad Sci, State Key Lab High Field Laser Phys, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China
[2] Chinese Acad Sci, Grad Univ, Beijing 100039, Peoples R China
来源：
OPTICS EXPRESS | 2009年 / 17卷 / 03期
关键词：
DEPLETION FLUORESCENCE MICROSCOPY; DIFFRACTION RESOLUTION LIMIT; LAGUERRE-GAUSSIAN BEAMS; ELECTROMAGNETIC DIFFRACTION; INTEGRAL-REPRESENTATION; STIMULATED-EMISSION; OPTICAL SYSTEMS; IMAGE FIELD; FREE-SPACE; POLARIZATION;
D O I：
10.1364/OE.17.001714
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The structure of the inhibition patterns is important to the stimulated emission depletion (STED) microscopy. Usually, Laguerre-Gaussian (LG) beam and the central zero-intensity patterns created by inserting phase masks in Gaussian beams are used as the erase beam in STED microscopy. Aberration is generated when focusing beams through an interface between the media of the mismatched refractive indices. By use of the vectorial integral, the effects of such aberration on the shape of depletion patterns and the size of fluorescence emission spot in the STED microscopy are studied. Results are presented as a comparison between the aberration-free case and the aberrated cases. (C) 2009 Optical Society of America
引用
收藏
页码：1714 / 1725
页数：12
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