Characterization of Ge-Sb-Te thin films deposited using a composition-spread approach

Ge-Sb-Te Thin films for rewritable phase change optical data storage applications were deposited by magnetron sputtering using a composition-spread approach. The deposition took place in an UHV chamber by cosputtering of three magnetron cathodes equipped with pure Ge-, Sb- and Te-targets in a DC-argon plasma. To investigate the influence of the chemical composition of the phase change material on its optical properties, films with lateral compositional gradients of up to 30 at.% were deposited. The composition, binding states and structure of the films were investigated by EPMA mappings, XPS, AES, RHEED and GIXRD on plain Si wafers, whereas the phase change velocity of Ge-Sb-Te was determined on Si-Al-SiO2 stacks. The change between amorphous and crystalline phases of the films was induced and characterized with a static tester consisting of an optical microscope with an integrated high power laser diode. The change in reflectivity induced by the laser pulses was measured by a high sensitivity photo detector. Depending on the composition, the duration for the initial crystallization was determined between 220 and 500 ns, while the re-amorphization required between 20 and 120 ns. Structural analyses proved the existence of two crystalline phases with cubic and hexagonal structure in the initialized films. (C) 2001 Elsevier Science B.V All rights reserved.