Preparation of location-specific thin foils from Fe-3% Si bi- and tri-crystals for examination in a FEG-STEM

被引:5
作者
Sorbello, F. [1 ]
Hughes, G. M. [1 ]
Lejcek, P. [2 ]
Heard, P. J. [1 ]
Flewitt, P. E. J. [1 ,3 ]
机构
[1] Univ Bristol, Interface Anal Ctr, Bristol BS2 8BS, Avon, England
[2] Acad Sci Czech Republ, Inst Phys, Prague 18221 8, Czech Republic
[3] Univ Bristol, HH Wills Phys Lab, Bristol BS8 1TL, Avon, England
基金
英国工程与自然科学研究理事会;
关键词
FEG-STEM; Fe-3% Si; Thin foils; Focused ion beam; SAMPLE PREPARATION; MICROSCOPY; GROWTH; SPECIMENS; DAMAGE;
D O I
10.1016/j.ultramic.2008.08.011
中图分类号
TH742 [显微镜];
学科分类号
摘要
Bi-crystals and tri-crystals of a nominal Fe-3% Si (wt%) of well-defined orientations have been grown using a floating-zone technique with optical heating. The manufacture of these unique crystals and the preparation technique involved in harvesting thin foils from specific locations for transmission electron microscopy are described in detail. In particular, the grain boundary triple junction has been extracted from the tri-crystal and examined in high-resolution aberration-corrected FEG-STEM instruments. To achieve the necessary resolution, the foils have to be uniformly thin, in the range 50-100 nm over large areas of the specimen. For ferromagnetic materials, there are further challenges arising from the magnetic field interaction, with the electron beam placing significant demands on the aberration correction system. One way to minimise this interaction is to reduce the total mass of magnetic material. To achieve this, an in situ focused ion beam lift-out technique has been combined with an additional precision ion-polishing stage to reproducibly provide thin-foil specimens suitable for high-resolution EELS and EDX analysis. Examination of the foils reveals that the final precision ion-polishing stage removes residual damage arising from the use of focused ion beam milling procedures. Crown Copyright (C) 2008 Published by Elsevier B.V. All rights reserved.
引用
收藏
页码:147 / 153
页数:7
相关论文
共 22 条
[1]   Melt growth of non-isoaxial bicrystals of an Fe-3%Si alloy [J].
Adámek, J ;
Lejcek, P .
JOURNAL OF CRYSTAL GROWTH, 2000, 211 (1-4) :461-465
[2]   TEM preparation by "low voltage" FIB [J].
Altmann, Frank ;
Graff, Andreas ;
Simon, Michel ;
Hoffmeister, Himar ;
Gnauck, Peter .
PRAKTISCHE METALLOGRAPHIE-PRACTICAL METALLOGRAPHY, 2006, 43 (08) :396-405
[3]  
Anderson - T.L., 1991, FRACTURE MECH FUNDAM
[4]   Cleavage cracking resistance of large-angle grain boundaries in Fe-3 wt% Si alloy [J].
Argon, AS ;
Qiao, Y .
PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES, 2002, 82 (17-18) :3333-3347
[5]   RADIATION-DAMAGE IN ION-MILLED SPECIMENS - CHARACTERISTICS, EFFECTS AND METHODS OF DAMAGE LIMITATION [J].
BARBER, DJ .
ULTRAMICROSCOPY, 1993, 52 (01) :101-125
[6]   Imaging at the picoscale [J].
Bleloch, Andrew ;
Lupini, Andrew .
MATERIALS TODAY, 2004, 7 (12) :42-48
[7]  
DOIG P, 1984, SCRIPTA METALL MATER, V18, P561, DOI 10.1016/0036-9748(84)90340-5
[8]  
FLEWITT PEJ, 2000, PHYS METHODS MAT CHA
[9]   ELECTRON-INDUCED ATOMIC DISPLACEMENTS NEAR THRESHOLD IN THIN SINGLE-CRYSTAL FOILS [J].
GETTYS, WE .
PHYSICAL REVIEW, 1966, 146 (02) :480-&
[10]   A review of focused ion beam milling techniques for TEM specimen preparation [J].
Giannuzzi, LA ;
Stevie, FA .
MICRON, 1999, 30 (03) :197-204