Plane stress fracture toughness of freestanding nanoscale thin films

被引:47
作者
Hosokawa, H. [2 ]
Desai, A. V. [1 ]
Haque, M. A. [1 ]
机构
[1] Penn State Univ, Dept Mech & Nucl Engn, University Pk, PA 16802 USA
[2] Natl Inst Adv Ind Sci & Technol, Mat Res Inst Sustainable Dev, Moriyama Ku, Nagoya, Aichi 4638560, Japan
关键词
fracture toughness; thin films; compact tension test; micro-electro-mechanical systems; focused ion beam;
D O I
10.1016/j.tsf.2008.03.005
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Fracture toughness values of notched thin films were measured in-situ in the scanning electron microscope using a micro-machined experimental setup. Freestanding specimens, 200-300 nm thick, 2 mu m wide and about 10 mu m long, were fabricated from extruded gold micro-wire and sputtered aluminum films. The obtained values, 0.45 MPa m(1/2) for gold and 0.51 MPa m(1/2) for aluminum are on the same order of those for brittle materials. Such reduction in fracture toughness is discussed in light of reduced dislocation activities in the severely work hardened gold and dislocation starved aluminum specimens. (c) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:6444 / 6447
页数:4
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