Investigations of ZnO thin films deposited by a reactive pulsed laser ablation

被引：4

作者：

Cui, J. B. ^{[1
]}

Soo, Y. C. ^{[1
]}

Kandel, H. ^{[1
]}

Thomas, M. A. ^{[1
]}

Chen, T. P. ^{[1
]}

Daghlian, C. P. ^{[2
]}

机构：

[1] Univ Arkansas, Dept Phys & Astron, Little Rock, AR 72204 USA

[2] Dartmouth Coll, EM Facil, Hanover, NH 03755 USA

来源：

SCIENCE IN CHINA SERIES E-TECHNOLOGICAL SCIENCES | 2009年 / 52卷 / 01期

关键词：

thin films; pulsed laser deposition; optical property; zinc oxide; ZINC-OXIDE; OPTICAL-PROPERTIES; GROWTH; NANOWIRES; TEMPERATURE; TRANSPORT; TARGET; SI;

D O I：

10.1007/s11431-008-0339-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Highly transparent ZnO thin films were deposited at different substrate temperatures by pulsed laser deposition in an oxygen atmosphere. The thin films were characterized by various techniques including X-ray diffraction, scanning electron microscopy, optical absorption, and photoluminescence. We demonstrated that oriented wurtzite ZnO thin films could be deposited at room temperature using a high purity zinc target. Variable temperature photoluminescence revealed new characteristics in the band edge emission. The underlying mechanism for the observed phenomena was also discussed.

引用

页码：99 / 103

页数：5

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