Ab initio modeling and experimental study of C-B interactions in Si

被引:32
作者
Liu, CL [2 ]
Windl, W
Borucki, L
Lu, SF
Liu, XY
机构
[1] Motorola Inc, Digital DNA Labs, Austin, TX 78721 USA
[2] Motorola Inc, Digital DNA Labs, Mesa, AZ 85202 USA
[3] Motorola Inc, Phys Sci Res Lab, Los Alamos, NM 87544 USA
关键词
D O I
10.1063/1.1430505
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present results of ab initio calculations for the structure and energetics of small boron-carbon-interstitial and carbon-interstitial clusters in silicon and a respective continuum model for the nucleation, growth, and dissolution of these clusters. To test our calculations, we also measure secondary-ion mass spectra of boron and carbon in a SiGeCB system, which our model reproduces well. For the considered concentration regime, we find rapid carbon diffusion, nearly immobile boron, and undersaturation of silicon self-interstitials, resulting mainly from two clusters suggested by our ab initio results, the dicarbon-interstitial cluster and the boron-carbon-interstitial cluster. (C) 2002 American Institute of Physics.
引用
收藏
页码:52 / 54
页数:3
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