Semiconductor microlenses fabricated by one-step focused ion beam direct writing

被引：30

作者：

Fu, YQ ^{[1
]}

Bryan, NK ^{[1
]}

机构：

[1] Nanyang Technol Univ, Sch Mech & Prod Engn, Precis Engn & Nanotechnol Ctr, Singapore 639798, Singapore

来源：

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | 2002年 / 15卷 / 02期

关键词：

direct writing; FIB; microlens; refraction; semiconductor material;

D O I：

10.1109/66.999597

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We fabricated a refractive semiconductor microlenses using a focused ion beam (FIB) direct writing technique. The simple one-step FIB process produced high-quality microlenses of silicon, the most popular and low cost semiconductor material used in optoelectronics. A spherical Si microlens with a nominal lens diameter of 48 mum exhibited a radius curvature and focal length of 100 and 40 mum, respectively. The maximum derivation between the measured and designed profiles is less than lambda/100. The surface roughness, RMS, measured by use of atomic force microscope in 1 X 1 mum(2) square area, is 1.1 rim. This microlens fabrication method could be readily applicable due to the simplicity in processing and the high-quality results.

引用

页码：229 / 231

页数：3

共 9 条

[1]

FUTHEY J, 1992, OSA TECHNICAL DIGEST, V9, P4

[2]

GALE MT, 1983, P SOC PHOTO-OPT INST, V398, P347, DOI 10.1117/12.935397

[3]

JAY TR, 1993, P SOC PHOTO-OPT INS, V1992, P275

[4] Semiconductor microlenses fabricated by one-step wet etching [J].