Nanocrystalline chromium-based coatings deposited by DLI-MOCVD under atmospheric pressure from Cr(CO)6

被引：12

作者：

Douard, A ^{[1
]}

Maury, F ^{[1
]}

机构：

[1] CIRIMAT, CNRS, INPT, UPS,ENSIACET, F-31077 Toulouse 4, France

来源：

SURFACE & COATINGS TECHNOLOGY | 2006年 / 200卷 / 22-23期

关键词：

DLI-CVD; MOCVD; chromium-based coatings; atmospheric deposition process;

D O I：

10.1016/j.surfcoat.2005.11.043

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Nanocrystalline original Cr-based coatings were grown under atmospheric pressure by Direct Liquid Injection Metal Organic Chemical Vapor Deposition (DLI-MOCVD). The thin films were grown below 450 degrees C in a cold wall CVD reactor from solutions of Cr(CO)(6) in toluene or THF injected and flash vaporized with or without NH3 addition prior to the deposition zone. Original nanocrystalline chromium oxycarbide and oxycarbonitride phases were deposited on stainless steel substrates. The influence of injection parameters and conventional CVD conditions have been investigated on the main chemical, physical and structural characteristics of the coatings, as deduced from XRD, SEM, and EPMA analyses. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：6267 / 6271

页数：5

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