Structure in RF hydrogen plasma induced by magnetic field

被引：2

作者：

Barnat, E. V. ^{[1
]}

机构：

[1] Sandia Natl Labs, Albuquerque, NM 87185 USA

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 2008年 / 36卷 / 04期

关键词：

double layer; hydrogen plasma; magnetic field; radio frequency discharge;

D O I：

10.1109/TPS.2008.917788

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Images of the spatial structure of a capacitively coupled hydrogen discharge are presented for various strengths of applied magnetic field. With increasing magnetic field, we find that not only does the distribution of emission change because of the confinement of the electrons by the magnetic field, but we also find "dark-bands" regions that form in the discharge. By using narrowband interference filters (similar to 10 nm bandwidth), we examine how the relative optical emission centered on H-alpha and H-beta (with respect to the total optical emission) change with the applied magnetic field.

引用

页码：1362 / 1363

页数：2

共 5 条

[1] THEORY OF A DOUBLE SHEATH BETWEEN 2 PLASMAS [J].

ANDREWS, JG ;

ALLEN, JE .

PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1971, 320 (1543) :459-&

[2]

BARNAT EV, PLASMA SOURCES UNPUB

[3] WEAK DOUBLE-LAYERS [J].

HERSHKOWITZ, N ;

PAYNE, GL ;

CHAN, C ;

DEKOCK, JR .

PLASMA PHYSICS AND CONTROLLED FUSION, 1981, 23 (10) :903-925

[4] A theory for formation of a low pressure, current-free double layer [J].

Lieberman, M. A. ;

Charles, C. ;

Boswell, R. W. .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2006, 39 (15) :3294-3304

[5]

TAND D, 2003, J APPL PHYS, V94, P1390

← 1 →