Comparison of oxygen vacancy defects in crystalline and amorphous Ta2O5

被引:30
作者
Guo, Yuzheng [1 ]
Robertson, John [1 ]
机构
[1] Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England
基金
英国工程与自然科学研究理事会;
关键词
Ta2O5; RRAM; Oxygen vacancy; DFT; Diffusion; Switching; 1ST PRINCIPLES; THIN-FILMS; OXIDE; MECHANISM;
D O I
10.1016/j.mee.2015.04.065
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The structure, formation energy and energy levels of the oxygen vacancies in crystalline and amorphous Ta2O5 have been calculated by first principle methods. In the crystalline phase, the 2-fold coordinated intra-layer vacancy is the lowest cost vacancy, and forms a deep level 1.5 eV below the conduction band edge. The 3-fold intra-layer vacancy and the 2-fold inter-layer vacancy are higher cost defects, and form shallower levels. In the amorphous phase, the lower density results in higher concentration of inter-layer like 2-fold O coordination. The O vacancy diffusion barrier is 0.1-0.3 eV in both cases, (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:254 / 259
页数:6
相关论文
共 41 条
[11]   First principles methods using CASTEP [J].
Clark, SJ ;
Segall, MD ;
Pickard, CJ ;
Hasnip, PJ ;
Probert, MJ ;
Refson, K ;
Payne, MC .
ZEITSCHRIFT FUR KRISTALLOGRAPHIE, 2005, 220 (5-6) :567-570
[12]   Screened exchange density functional applied to solids [J].
Clark, Stewart J. ;
Robertson, John .
PHYSICAL REVIEW B, 2010, 82 (08)
[13]  
DeGraeve R., 2013, VLSI IEEE, V8, P1
[14]   Polarization dependent two-photon properties in an organic crystal [J].
Fang, Hong-Hua ;
Yang, Jie ;
Ding, Ran ;
Chen, Qi-Dai ;
Wang, Lei ;
Xia, Hong ;
Feng, Jing ;
Ma, Yu-Guang ;
Sun, Hong-Bo .
APPLIED PHYSICS LETTERS, 2010, 97 (10)
[15]   Defect dominated charge transport in amorphous Ta2O5 thin films [J].
Fleming, RM ;
Lang, DV ;
Jones, CDW ;
Steigerwald, ML ;
Murphy, DW ;
Alers, GB ;
Wong, YH ;
van Dover, RB ;
Kwo, JR ;
Sergent, AM .
JOURNAL OF APPLIED PHYSICS, 2000, 88 (02) :850-862
[16]   Prediction of hexagonal Ta2O5 structure by first-principles calculations [J].
Fukumoto, A ;
Miwa, K .
PHYSICAL REVIEW B, 1997, 55 (17) :11155-11160
[17]   The O-Ta (oxygen-tantalum) system [J].
Garg, SP ;
Krishnamurthy, N ;
Awasthi, A ;
Venkatraman, M .
JOURNAL OF PHASE EQUILIBRIA, 1996, 17 (01) :63-77
[18]   Hybrid functional calculations of the Al impurity in α quartz: Hole localization and electron paramagnetic resonance parameters [J].
Gillen, Roland ;
Robertson, John .
PHYSICAL REVIEW B, 2012, 85 (01)
[19]   Oxygen vacancy defects in Ta2O5 showing long-range atomic re-arrangements [J].
Guo, Yuzheng ;
Robertson, John .
APPLIED PHYSICS LETTERS, 2014, 104 (11)
[20]  
Kubaschewski O., 1979, Metallurgical thermochemistry