Comparison of oxygen vacancy defects in crystalline and amorphous Ta2O5

被引:30
作者
Guo, Yuzheng [1 ]
Robertson, John [1 ]
机构
[1] Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England
基金
英国工程与自然科学研究理事会;
关键词
Ta2O5; RRAM; Oxygen vacancy; DFT; Diffusion; Switching; 1ST PRINCIPLES; THIN-FILMS; OXIDE; MECHANISM;
D O I
10.1016/j.mee.2015.04.065
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The structure, formation energy and energy levels of the oxygen vacancies in crystalline and amorphous Ta2O5 have been calculated by first principle methods. In the crystalline phase, the 2-fold coordinated intra-layer vacancy is the lowest cost vacancy, and forms a deep level 1.5 eV below the conduction band edge. The 3-fold intra-layer vacancy and the 2-fold inter-layer vacancy are higher cost defects, and form shallower levels. In the amorphous phase, the lower density results in higher concentration of inter-layer like 2-fold O coordination. The O vacancy diffusion barrier is 0.1-0.3 eV in both cases, (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:254 / 259
页数:6
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