Ferromagnetism in post-annealed sputtered Cr-doped In2O3 thin films

被引:3
作者
Ait-El-Aoud, Yassine [1 ]
Hickey, Mark C. [1 ]
Kussow, Adil-Gerai [2 ]
Akyurtlu, Alkim [1 ]
机构
[1] Univ Massachusetts, Dept Elect & Comp Engn, Ctr Electromagnet Mat & Opt Syst, Lowell, MA 01854 USA
[2] Univ Massachusetts, Dept Phys, Lowell, MA 01854 USA
来源
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2013年 / 210卷 / 12期
基金
美国国家科学基金会;
关键词
annealing; ferromagnetic properties; In2O3; oxygen deficiency; sputtering; thin films; CARRIER CONCENTRATION; MAGNETISM; FE; SEMICONDUCTOR; FABRICATION; OXYGEN; MN;
D O I
10.1002/pssa.201228780
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In the present work, we have studied the effect of a post-annealing process on the magnetic properties of thin films of Cr-doped indium oxide, In2-xCrxO3-. Samples with low stoichiometric oxygen deficiency, , which is required for ferromagnetic behavior, were fabricated using a DC/RF magnetron sputtering method. The post-annealing process described in this paper allows control of the oxygen deficiency. This method has led to samples which show clear ferromagnetic behavior at both low temperatures and at room temperature with saturation magnetic moments up to approximate to 1.5 mu(B)/Cr-atoms. The measured high Curie temperature, T-C approximate to 740K, justifies the indirect electron-mediated ferromagnetic coupling of the spins of Cr ions. The ferromagnetic coupling was found to be mostly a bulk effect, which is not affected by the surface of the film.
引用
收藏
页码:2644 / 2649
页数:6
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