Valence Band Modification of a (GaxIn1-x)2O3 Solid Solution System Fabricated by Combinatorial Synthesis

被引:10
作者
Nagata, Takahiro [1 ]
Hoga, Takeshi [1 ,2 ]
Yamashita, Akihiro [3 ,4 ]
Asahi, Toru [3 ]
Yagyu, Shinjiro [1 ]
Chikyow, Toyohiro [4 ]
机构
[1] Natl Inst Mat Sci NIMS, Int Ctr Mat Nanoarchitecton WPI MANA, Tsukuba, Ibaraki 3050044, Japan
[2] Tsuruoka Coll, Natl Inst Technol, Dept Creat Engn, Yamagata, Yamagata 9978511, Japan
[3] Waseda Univ, Grad Sch Adv Sci & Engn, Shinjuku Ku, Tokyo 1698555, Japan
[4] NIMS, Mat Data & Integrated Syst MaDIS, Tsukuba, Ibaraki 3050044, Japan
基金
日本科学技术振兴机构; 日本学术振兴会;
关键词
wide band gap oxide semiconductor; surface electron accumulation layer; X-ray photoelectron spectroscopy; combinatorial pulsed laser deposition method; MOLECULAR-BEAM EPITAXY; THIN-FILM; OPTICAL-PROPERTIES; IN2O3; GAP;
D O I
10.1021/acscombsci.0c00033
中图分类号
O69 [应用化学];
学科分类号
081704 ;
摘要
The correlation between the crystal structure and valence band structure of a (GaxIn1-x)(2)O-3 solid solution system was investigated by using combinatorial synthesis. At a low Ga content of (GaxIn1-x)(2)O-3 with a single-phase cubic In2O3 crystal structure, a surface electron accumulation layer (SEAL), which is an important electrical phenomenon in In2O3, was confirmed. When the Ga content increased to approximately x = 0.4, mixed crystal structures of Ga2O3 and In2O3 were produced. Above x = 0.5, the dominant valence band structure was attributed to Ga2O3, the SEAL disappeared, and the sheet resistance increased greatly by 5 orders of magnitude or more. The in-gap state and valence band structure of the (GaxIn1-x)(2)O-3 solid solution system were strongly affected by Ga2O3; however, the valence band maximum position shifted to a higher binding energy.
引用
收藏
页码:433 / 439
页数:7
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