Novel device structure for phase change memory toward low-current operation

被引:6
作者
Kim, Eunha [1 ]
Kang, Nam Soo [1 ]
Yang, Hyung-Jun [1 ]
Sutou, Yuji [2 ]
Song, Yun-Heub [1 ]
机构
[1] Hanyang Univ, Dept Elect Engn, Seoul 133791, South Korea
[2] Tohoku Univ, Dept Mat Sci, Sendai, Miyagi 9808579, Japan
基金
新加坡国家研究基金会;
关键词
ARRAY; FABRICATION;
D O I
10.7567/JJAP.54.094302
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present a novel device architecture for low set and reset currents in phase change random access memory (PCRAM). In this structure, the sidewall of phase-change film is contacted with the vertical heating layer. In particular, to realize a small contact area of under 50 nm(2) for low reset current, this structure includes stacked layers consisting of extremely thin phase change material (PCM) and conduction films, the fabrication method of which is proposed. We estimated set and reset currents for the proposed structure by the device simulation method. Here, we confirmed that a contact area of 30 nm(2) in this structure, where Ge2Sb2Te5 is used as PCM, provides a reset current of 13.5 mu A and a set current of 4 mu A, which are promising for the scaling down of PCM. Furthermore, it is confirmed that the thinner PCM in this structure provides less thermal disturbance to the neighboring cell. From the results, we expect this structure to be a promising candidate for a high-density nonvolatile memory architecture with PCM. (C) 2015 The Japan Society of Applied Physics
引用
收藏
页数:4
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