Microstructure and Density of Mo Films in Multilayer Mo/Si Mirrors

被引：1

作者：

Vainer, Yu. A. ^{[1
]}

Garakhin, S. A. ^{[1
]}

Polkovnikov, V. N. ^{[1
]}

Salashchenko, N. N. ^{[1
]}

Svechnikov, M. V. ^{[1
]}

Chkhalo, N. I. ^{[1
]}

Yunin, P. A. ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Phys Microstruct, Nizhnii Novgorod 607680, Russia

来源：

JOURNAL OF SURFACE INVESTIGATION | 2019年 / 13卷 / 01期

基金：

俄罗斯基础研究基金会; 俄罗斯科学基金会;

关键词：

X-ray multilayer mirror; X-ray diffraction; thin film density; coherent-scattering region; Williamson-Hall plot; aperiodic mirror; THICKNESS;

D O I：

10.1134/S1027451019010208

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Using the wide-angle and small-angle X-ray diffraction techniques, the Mo density is obtained as a function of the layer thickness in periodic X-ray Mo/Si mirrors synthesized by magnetron sputtering in an argon atmosphere. By the example of a simulated aperiodic multilayer Mo/Si mirror, the necessity to take into account the real density of Mo and the incorrect use of its tabulated densities is demonstrated.

引用

页码：8 / 13

页数：6

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