Diffusion coefficients of boron in vitreous silica at high temperatures

被引：8

作者：

Kirchhof, Johannes ^{[1
]}

Unger, Sonja ^{[1
]}

Dellith, Jan ^{[1
]}

Scheffel, Andy ^{[1
]}

Teichmann, Christian ^{[1
]}

机构：

[1] Inst Photon Technol IPHT, D-07745 Jena, Germany

来源：

OPTICAL MATERIALS EXPRESS | 2012年 / 2卷 / 05期

关键词：

BOROSILICATE GLASSES; DEPOSITION; VISCOSITY; FLUORINE; BEHAVIOR; SYSTEM; SI;

D O I：

10.1364/OME.2.000534

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The diffusion of boron in yB(2)O(3)(1-y)SiO2 glasses with up to 8 mol% B2O3 was investigated by annealing doped layers on the inner surface of quartz glass tubes between 1700 degrees C and 2000 degrees C and measuring radial doping profiles by X-ray microprobe analysis and refractive index profiling subsequent to the tube collapse. By comparison with calculated profiles, diffusion coefficients could be determined and fitted by an Arrhenius function, where the preexponential D-0 = 10(0.38) cm(2)s(-1) is constant, but the activation energy decreases with increasing concentration according to E = (449-4.8.c(1.06)) kJ.mol(-1) (c[mol% B2O3] = 100y). (C) 2012 Optical Society of America

引用

页码：534 / 547

页数：14

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