Synthesis of Nanostructure Carbon Films Deposited by Microwave Plasma-Enhanced Chemical Vapor Deposition Technique at Room Temperature

被引：3

作者：

Bisht, Atul ^{[1
]}

Chockalingam, Sreekumar ^{[1
]}

Panwar, O. S. ^{[1
]}

Srivastava, A. K. ^{[1
]}

Kesarwani, Ajay Kumar ^{[1
]}

机构：

[1] CSIR Natl Phys Lab, Polymorph Carbon Thin Films Grp, Phys Energy Harvesting Div, New Delhi 110012, India

来源：

FULLERENES NANOTUBES AND CARBON NANOSTRUCTURES | 2015年 / 23卷 / 05期

关键词：

ns-carbon film; MW PECVD; SEM; XRD; HRTEM; GRAPHENE; PECVD; GROWTH;

D O I：

10.1080/1536383X.2014.921783

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

This paper reports the synthesis of nanostructure carbon (ns-carbon) films deposited by microwave plasma-enhanced chemical vapor deposition (MW PECVD) technique at low pressure and room temperature. ns-carbon films have been characterized by scanning electron microscopy, electron dispersive x-ray spectroscopic analysis, atomic force microscopy, Raman spectroscopy, X-ray diffraction, UV-visible spectroscopy and high-resolution transmission electron microscopy. The shape of nanostructure is changing from granular to sheet-like structure when the pressure increased from 55 to 110 mTorr.

引用

收藏

页码：455 / 462

页数：8

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