Hot wall epitaxy of Sb2Te3 layers: coherent hetero-epitaxy on InAs(111) and Sb substitution in Cu-mediated growth

被引:8
作者
Takagaki, Y. [1 ]
Jenichen, B. [1 ]
Jahn, U. [1 ]
Manzke, Y. [1 ]
Ramsteiner, M. [1 ]
Friedland, K-J [1 ]
机构
[1] Paul Drude Inst Festkorperelekt, D-10117 Berlin, Germany
关键词
BI2SE3; BI2TE3; FILMS;
D O I
10.1088/0268-1242/28/2/025012
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The growth of Sb2Te3 layers by means of hot wall epitaxy is investigated. While the layers grow coherently on InAs(1 1 1) substrates owing to the small lattice mismatch, the appropriate substrate temperature is restricted to a narrow range and the surface preparations play a critical role for the growth due to the rapid re-evaporation of Sb2Te3. We also examine the growth on various substrates having a pre-deposited Cu layer. The Cu layer retains Sb2Te3 at the surface and thus extends the usable substrate-temperature range. During the substitution of the Sb atoms with the Cu atoms, we encounter an incorporation of the group-III elements to the grown layers when III-V compounds are used as the substrates. We additionally present the low-temperature magnetotransport properties in a layer synthesized by the substitution.
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页数:7
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