Nanoporous Structure Fabrication in Selective Areas by Block Copolymer Self-Assembly and Electron Beam Lithography

被引：2
作者：
Suzuki, Hiroyuki [1 ]
Kometani, Reo [1 ]
Ishihara, Sunao [1 ]
Warisawa, Shin'ichi [1 ]
机构：
[1] Univ Tokyo, Dept Mech Engn, Grad Sch Engn, Bukyo Ku, Tokyo 1138656, Japan
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2012年 / 25卷 / 01期
关键词：
block copolymer self-assembly; electron beam lithography; selective patterning; nanoporous structure; MORPHOLOGY; PATTERNS; NANODOTS; DENSITY; ARRAYS; LAYERS; FILMS;
D O I：
10.2494/photopolymer.25.33
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
[No abstract available]
引用
收藏
页码：33 / 36
页数：4
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