Controlled synthesis of gas sensing Cr2-xTixO3 films by electrostatic spray assisted vapour deposition and their structural characterisation

被引：18

作者：

Du, J

Wu, YQ

Choy, KL ^{[1
]}

机构：

[1] Univ Nottingham, Sch Mech Mat & Mfg Engn, Nottingham NG7 2RD, England

[2] Univ London Imperial Coll Sci Technol & Med, Dept Mat, London SW7 2AZ, England

来源：

THIN SOLID FILMS | 2006年 / 497卷 / 1-2期

关键词：

Cr2-xTixO3; films; deposition process; sensors; surface morphology;

D O I：

10.1016/j.tsf.2005.09.169

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Titanium substituted chromium oxide Cr2-xTixO3 is an excellent gas sensor material, which can be applied at the elevated temperatures for the detection of combustible and toxic gases. A versatile and cost-effective Electrostatic Spray Assisted Vapour Deposition (ESAVD) is used to prepare Cr2-xTixO3 materials. The crystalline phase, composition and microstructure of Cr2-xTixO3 films prepared by ESAVD are characterised by X-ray diffraction, scanning electron microscope, X-ray photoelectron spectroscopy and Raman microscope. In this paper, we report the relationships between the processing parameters and the microstructure of the deposited films. The Cr1.8Ti0.2O3 films with more ordered porous structure and smaller grain size deposited by ESAVD show a typical sensing behaviour with the sensitivity of around 45% at 500 degrees C to 500 ppm ammonia. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：42 / 47

页数：6

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