Electrical properties of pure and metal doped pulsed laser deposited carbon films

被引：20
|
作者：
Orlianges, JC
Champeaux, C
Catherinot, A
Pothier, A
Blondy, P
Abelard, P
Angleraud, B
机构：
[1] CNRS, SPCTS, UMR 6638, F-87060 Limoges, France
[2] CNRS, UMR 6615, IRCOM, F-87060 Limoges, France
[3] CNRS, UMR 6502, LPCM IMN, F-44322 Nantes 3, France
来源：
THIN SOLID FILMS | 2004年 / 453卷
关键词：
tetrahedral amorphous carbon; metal doping; pulsed laser deposition; electrical properties; Poole-Frenkel emission;
D O I：
10.1016/j.tsf.2003.11.278
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Nickel and tantalum doped carbon films have been deposited under high vacuum by KrF laser ablation at ambient temperature. A computer controlled multi-target system allows predefined sequences of laser shots on the carbon and metallic targets, respectively, and consequently a well controlled metal doping of deposited carbon film. Electrical properties of pure and metal doped carbon films have been investigated and chemical bonding and film compositions determined using X-ray photoelectron spectroscopy (XPS). Finally, doped carbon films are integrated in fabrication of RF MEMS switches. (C) 2003 Elsevier B.V All rights reserved.
引用
收藏
页码：291 / 295
页数：5
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