Thermal Stability of Silicon Carbide Power JFETs

被引:10
|
作者
Buttay, Cyril [1 ]
Ouaida, Remy [2 ]
Morel, Herve [1 ]
Bergogne, Dominique [1 ]
Raynaud, Christophe [1 ]
Morel, Florent [1 ]
机构
[1] Univ Lyon, Lab Ampere, F-69621 Villeurbanne, France
[2] Thales Microelect, Thales Grp Cap Bretagne, F-35370 Etrelles, France
关键词
JFET; silicon carbide (SiC); thermal runaway; INSTABILITY; DEVICES;
D O I
10.1109/TED.2013.2287714
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Silicon carbide (SiC) JFETs are attractive devices, but they might suffer from thermal instability. An analysis shows that two mechanisms could lead to their failure: the loss of gate control, which can easily be avoided, and a thermal runaway caused by the conduction losses. Destructive experimental tests performed on a dedicated system show that the latter mechanism is more severe than initially expected. A low thermal resistance and gate driver equipped with protections systems are thus required to ensure safe operation of the SiC JFETs.
引用
收藏
页码:4191 / 4198
页数:8
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