Role of Defect-Induced Interfacial States in Molecular Sensing: Ultrahigh-Sensitivity Region for Molecular Interaction

被引:2
作者
Tripathi, Rahul [1 ]
Bhattacharyya, Pritam [2 ]
Shukla, Alok [2 ]
Misra, Abha [1 ]
机构
[1] Indian Inst Sci, Dept Instrumentat & Appl Phys, Bangalore 560012, Karnataka, India
[2] Indian Inst Technol, Dept Phys, Mumbai 400076, Maharashtra, India
基金
美国国家卫生研究院;
关键词
FEW-LAYER MOS2; TOTAL-ENERGY CALCULATIONS; HETEROSTRUCTURE; GRAPHENE; MOBILITY; SENSOR;
D O I
10.1103/PhysRevApplied.14.054014
中图分类号
O59 [应用物理学];
学科分类号
摘要
Defect-induced interfacial states are created in an atomically thin two-dimensional molybdenum-disulfide channel by underlying a narrow pattern of a graphene layer in a field effect transistor. A nondestructive method for the generation of charge states allowed a highly sensitive molecular interaction with sensitivity of nearly 3 orders of magnitude at room temperature. The presence of interfacial states in the channel leads to a conductance fluctuation and its magnitude is modulated using nitrogen-dioxide gas molecules in the subthreshold region. The study provides a systematic approach to establish a correlation between modulated conductance fluctuation and the molecular concentration up to parts per billion. First-principles density-functional theory further explains the role of unique interfacial configuration on conductance fluctuation. Therefore, our study demonstrates an experimental approach to induce charge state for the modulation of carrier concentration and exploits the role of defect-induced interfacial states in atomically thin interfaces for molecular interaction.
引用
收藏
页数:10
相关论文
共 57 条
[1]   Superior thermal conductivity of single-layer graphene [J].
Balandin, Alexander A. ;
Ghosh, Suchismita ;
Bao, Wenzhong ;
Calizo, Irene ;
Teweldebrhan, Desalegne ;
Miao, Feng ;
Lau, Chun Ning .
NANO LETTERS, 2008, 8 (03) :902-907
[2]   IMPROVED TETRAHEDRON METHOD FOR BRILLOUIN-ZONE INTEGRATIONS [J].
BLOCHL, PE ;
JEPSEN, O ;
ANDERSEN, OK .
PHYSICAL REVIEW B, 1994, 49 (23) :16223-16233
[3]   Chemical Sensing of 2D Graphene/MoS2 Heterostructure device [J].
Cho, Byungjin ;
Yoon, Jongwon ;
Lim, Sung Kwan ;
Kim, Ah Ra ;
Kim, Dong-Ho ;
Park, Sung-Gyu ;
Kwon, Jung-Dae ;
Lee, Young-Joo ;
Lee, Kyu-Hwan ;
Lee, Byoung Hun ;
Ko, Heung Cho ;
Hahm, Myung Gwan .
ACS APPLIED MATERIALS & INTERFACES, 2015, 7 (30) :16775-16780
[4]  
Davies J.H, 1997, The Physics of Low-Dimensional Semiconductors: An Introduction, DOI 10.1017/CBO9780511819070
[5]   Asymmetric Schottky Contacts in Bilayer MoS2 Field Effect Transistors [J].
Di Bartolomeo, Antonio ;
Grillo, Alessandro ;
Urban, Francesca ;
Iemmo, Laura ;
Giubileo, Filippo ;
Luongo, Giuseppe ;
Amato, Giampiero ;
Croin, Luca ;
Sun, Linfeng ;
Liang, Shi-Jun ;
Ang, Lay Kee .
ADVANCED FUNCTIONAL MATERIALS, 2018, 28 (28)
[6]   Hysteresis in the transfer characteristics of MoS2 transistors [J].
Di Bartolomeo, Antonio ;
Genovese, Luca ;
Giubileo, Filippo ;
Iemmo, Laura ;
Luongo, Giuseppe ;
Foller, Tobias ;
Schleberger, Marika .
2D MATERIALS, 2018, 5 (01)
[7]   Tunable MoS2 bandgap in MoS2-graphene heterostructures [J].
Ebnonnasir, Abbas ;
Narayanan, Badri ;
Kodambaka, Suneel ;
Ciobanu, Cristian V. .
APPLIED PHYSICS LETTERS, 2014, 105 (03)
[8]   Experimental detection of active defects in few layers MoS2 through random telegraphic signals analysis observed in its FET characteristics [J].
Fang, Nan ;
Nagashio, Kosuke ;
Toriumi, Akira .
2D MATERIALS, 2017, 4 (01)
[9]   Few-Layer MoS2: A Promising Layered Semiconductor [J].
Ganatra, Rudren ;
Zhang, Qing .
ACS NANO, 2014, 8 (05) :4074-4099
[10]   A MOS capacitor model for ultra-thin 2D semiconductors: the impact of interface defects and channel resistance [J].
Gaur, Abhinav ;
Agarwal, Tarun ;
Asselberghs, Inge ;
Radu, Iuliana ;
Heyns, Marc ;
Lin, Dennis .
2D MATERIALS, 2020, 7 (03)