Ventricular septal defect and left ventricular outflow tract obstruction after transcatheter aortic valve implantation

被引:3
作者
Ancona, Marco [1 ]
Castiglioni, Alessandro [1 ]
Giannini, Francesco [1 ]
Mangieri, Antonio [1 ]
Regazzoli, Damiano [1 ]
Romano, Vittorio [1 ]
Giglio, Manuela [1 ]
Ancona, Francesco [1 ]
Stella, Stefano [1 ]
Agricola, Eustachio [1 ]
Cacucci, Michele [2 ]
Buzzatti, Nicola [1 ]
Alfieri, Ottavio [1 ]
Montorfano, Matteo [1 ]
Colombo, Antonio [1 ]
Latib, Azeem [1 ]
机构
[1] Osped San Raffaele, 60 Olgettina, I-20132 Milan, Italy
[2] Osped Maggiore Crema, Crema, Italy
关键词
intracardiac shunt after transcatheter aortic valve implantation; left ventricular outflow tract obstruction; transcatheter aortic valve implantation; ventricular septal defect;
D O I
10.2459/JCM.0000000000000625
中图分类号
R5 [内科学];
学科分类号
1002 ; 100201 ;
摘要
Ventricular septal defect (VSD) has been reported as a rare complication after transcatheter aortic valve implantation (TAVI), presenting with signs of heart failure. Furthermore, left ventricular outflow tract obstruction (LVOTO) may worsen after TAVI, especially in cases of severe left ventricular hypertrophy and small cavity. However, the simultaneous appearance of VSD and LVOT after TAVI has not been reported before. We report a case of combined VSD and LVOTO after TAVI.
引用
收藏
页码:181 / 182
页数:2
相关论文
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