Characteristics of multi-element (ZrTaNbTiW)N films prepared by magnetron sputtering and plasma based ion implantation

被引：27

作者：

Feng, Xingguo ^{[1
]}

Tang, Guangze ^{[2
]}

Ma, Xinxin ^{[1
]}

Sun, Mingren ^{[3
]}

Wang, Liqin ^{[4
]}

机构：

[1] Harbin Inst Technol, State Key Lab Adv Welding & Joining, Harbin 150001, Peoples R China

[2] Harbin Inst Technol, Natl Key Lab Mat Behav & Evaluat Space Environm, Harbin 150001, Peoples R China

[3] Harbin Inst Technol, Natl Key Lab Sci & Technol Precis Hot Proc Met, Harbin 150001, Peoples R China

[4] Harbin Inst Technol, Sch Mechatron Engn, Harbin 150001, Peoples R China

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2013年 / 301卷

关键词：

Multi-element nitrides; Magnetron sputtering; Ion implantation; Structure; Hardness; TRIBOLOGICAL PROPERTIES; THIN-FILMS; COATINGS; NITROGEN; MICROSTRUCTURE; DEPOSITION; ALLOYS; NBN; XPS;

D O I：

10.1016/j.nimb.2013.03.001

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Multi-element (ZrTaNbTiW)N films are prepared by multi-target magnetron sputtering deposition and nitrogen plasma based ion implantation (PBII). The composition, structure and mechanical properties of the films are investigated. X-ray photoelectron spectroscopy (XPS) confirms the formation of a mixture of ZrN, TiN, TaN, Nb N, ZrO2, Ta, Nb and W in the nitride film. X-ray diffraction (XRD) shows that the (ZrTaNbTiW) alloy film exhibits an amorphous phase, while the (ZrTaNbTiW)N nitride films are composed of BCC and FCC structures. The hardness and modulus of the films are improved significantly after nitrogen PBII and reach maximum values of 13.5 and 178.9 GPa, respectively. (C) 2013 Elsevier B.V. All rights reserved.

引用

页码：29 / 35

页数：7

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