Characterization of Plasma Jet in Plasma Spray-Physical Vapor Deposition of YSZ Using a <80 kW Shrouded Torch Based on Optical Emission Spectroscopy

被引:35
作者
Chen, Qing-Yu [1 ]
Peng, Xiao-Zhuang [1 ]
Yang, Guan-Jun [1 ]
Li, Cheng-Xin [1 ]
Li, Chang-Jiu [1 ]
机构
[1] Xi An Jiao Tong Univ, Sch Mat Sci & Engn, State Key Lab Mech Behav Mat, Xian 710049, Shaanxi, Peoples R China
基金
中国国家自然科学基金;
关键词
optical emission spectroscopy; PS-PVD; shrouded plasma torch; yttria-stabilized zirconia; NUMBER DENSITIES; COATINGS; TEMPERATURE; 8YSZ;
D O I
10.1007/s11666-015-0248-9
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
During plasma spray-physical vapor deposition (PS-PVD) of yttria-stabilized zirconia (YSZ) coatings, evaporation of the YSZ powder is essential, but quite difficult when using a commercial < 80 kW plasma torch. In this study, a shrouded plasma torch was examined to improve the YSZ evaporation. The plasma characteristics were diagnosed using optical emission spectroscopy. Results showed that the electron number density in the plasma jet was maintained at an order of magnitude of 10(14) cm(-3), indicating local thermal equilibrium of the plasma jet. Compared with a conventional torch, the shrouded torch resulted in much higher plasma temperature and much lower electron number density. With the shrouded torch, more energy of the plasma was transferred to the YSZ material, leading to more evaporation of the YSZ powder and thereby a much higher deposition rate of the YSZ coating. These results show that use of a shrouded torch is a simple and effective approach to improve the evaporation of feedstock material during PS-PVD.
引用
收藏
页码:1038 / 1045
页数:8
相关论文
共 30 条
  • [1] SPECTROSCOPIC STUDY OF SOME RADIO-FREQUENCY MIXED GAS PLASMAS
    ALDER, JF
    MERMET, JM
    [J]. SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1973, B 28 (11) : 421 - 433
  • [2] Effects of Solvents on Poly(3,4-Ethylenedioxythiophene) (PEDOT) Thin Films Deposited on a (3-Aminopropyl)Trimethoxysilane (APS) Monolayer by Vapor Phase Polymerization
    Ali, Mohammad Amdad
    Kim, Hyunho
    Jeong, Kyunghoon
    Soh, Hoesup
    Lee, Jaegab
    [J]. ELECTRONIC MATERIALS LETTERS, 2010, 6 (01) : 17 - 22
  • [3] [Anonymous], J APPL SPECTROSC
  • [4] [Anonymous], J ENG GAS TURB POWER
  • [5] [Anonymous], PLASMA DIAGNOSTICS
  • [6] [Anonymous], HDB ANAL CHEM 3 FASC
  • [7] [Anonymous], MAT MANUF P IN PRESS
  • [8] [Anonymous], ATOMIC SPECTRUM ANAL
  • [9] [Anonymous], THERMAL SPRAY
  • [10] [Anonymous], 2011, THERMAL SPRAY TACHNO, DOI DOI 10.1007/S11666-011-9654-9