Microprocessing of Arched Bridge Structures with Epoxy Resin by Proton Beam Writing

被引：3

作者：

Takano, Katsuyoshi ^{[1
]}

Asano, Atsushi ^{[1
]}

Maeyoshi, Yuta ^{[1
]}

Marui, Hiromi ^{[1
]}

Omichi, Masaaki ^{[1
]}

Saeki, Akinori ^{[1
]}

Seki, Shu ^{[1
]}

Satoh, Takahiro ^{[2
]}

Ishii, Yasuyuki ^{[2
]}

Kamiya, Tomihiro ^{[2
]}

Koka, Masashi ^{[2
]}

Ohkubo, Takeru ^{[2
]}

Sugimoto, Masaki ^{[3
]}

Nishikawa, Hiroyuki ^{[4
]}

机构：

[1] Osaka Univ, Grad Sch Engn, Div Appl Chem, Suita, Osaka 5650871, Japan

[2] Japan Atom Energy Agcy, Takasaki Adv Radiat Res Inst, Takasaki, Gunma 3701292, Japan

[3] Japan Atom Energy Agcy, Quantum Beam Directorate, Takasaki, Gunma 3701292, Japan

[4] Shibaura Inst Technol, Dept Elect Engn, Koto Ku, Tokyo 1358548, Japan

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2012年 / 25卷 / 01期

关键词：

proton beam writing; photolithography; three dimensional structure; supercritical drying; SU-8; photoresist;

D O I：

10.2494/photopolymer.25.43

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

[No abstract available]

引用

页码：43 / 46

页数：4

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