Growth of Electrodeposited ZnO Nanowires

被引:0
|
作者
Sunday, Joshua [1 ]
Amoah, Kweku [1 ]
Slaughter, Gymama [1 ]
机构
[1] Univ Maryland Baltimore Cty, Dept Comp Sci & Elect Engn, Bioelect Lab, Baltimore, MD 21228 USA
关键词
ARRAYS; FABRICATION; NANOTUBE;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Direct current electrodeposition method was used to deposit zinc oxide (ZnO) nanowire arrays from aqueous zinc chloride in ammonium chloride solution at 70 degrees C onto 10 mm x 10 mm anodic alumina oxide (AAO) templates. The AAO templates featured an average pore diameter of 80 nm. A 40 nm gold layer was sputtered onto the surface of the AAO templates before electrodeposition. ZnO nanowires were grown at a potential of (-)1V versus Ag/AgCl using DC potential amperometry. Characterization of ZnO nanowires was carried out for the as-deposited nanowire array. Atomic force microscopy was used to study the surface morphology. After deposition for 2.5 hours, the length of the nanowires was approximately 3.58 mu m on average. Scanning electron microscopy was used to view the cross-section of as-deposited ZnO nanowire array.
引用
收藏
页码:1916 / 1918
页数:3
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