Chemical analysis of graphene oxide films after heat and chemical treatments by X-ray photoelectron and Micro-Raman spectroscopy

被引:2937
作者
Yang, Dongxing [2 ]
Velamakanni, Aruna [2 ]
Bozoklu, Guelay [3 ]
Park, Sungjin [2 ]
Stoller, Meryl [2 ]
Piner, Richard D. [2 ]
Stankovich, Sasha [4 ]
Jung, Inhwa [2 ]
Field, Daniel A. [1 ]
Ventrice, Carl A., Jr. [1 ]
Ruoff, Rodney S. [2 ]
机构
[1] SW Texas State Univ, Dept Phys, San Marcos, TX 78666 USA
[2] Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA
[3] Sabanci Univ, Fac Engn & Nat Sci, TR-34956 Istanbul, Turkey
[4] Northwestern Univ, Dept Mech Engn, Evanston, IL 60208 USA
基金
美国国家科学基金会;
关键词
THIN-FILMS; GRAPHITE; XPS; TRANSPARENT; REDUCTION;
D O I
10.1016/j.carbon.2008.09.045
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Several nanometer-thick graphene oxide films deposited on silicon nitride-on silicon substrates were exposed to nine different heat treatments (three in Argon, three in Argon and Hydrogen, and three in ultra-high vacuum), and also a film was held at 70 degrees C while being exposed to a vapor from hydrazine monohydrate. The films were characterized with atomic force microscopy to obtain local thickness and variation in thickness over extended regions. X-ray photoelectron spectroscopy was used to measure significant reduction of the oxygen content of the films; heating in ultra-high vacuum was particularly effective. The overtone region of the Raman spectrum was used, for the first time, to provide a "fingerprint" of changing oxygen content. (C) 2008 Elsevier Ltd. All rights reserved.
引用
收藏
页码:145 / 152
页数:8
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