Preparation of KTiOPO4 thin films on different substrates by pulsed laser deposition

Pulsed laser deposition (PLD) technique is applied in fabrication of thin films of KTiOPO(4) (KTP) material, which possesses electro-optic and nonlinear optical properties. Thin film fabrication of optically functional KTP on fused silica and different sapphire substrates by changing an ambient oxygen pressure and a substrate temperature during PLD is investigated. Highly oriented KTP thin films could be grown on sapphire (11 (2) over bar0) in an oxygen atmosphere by PLD using a composite target whose stoichiometry is nearly same as KTP. Although the film contained polycrystalline crystallites, predominant crystallites seemed to be epitaxially grown.