Design and fabrication of SiO2/Si3N4 integrated-optics waveguides on silicon substrates

被引：11

作者：

Bulla, DAP ^{[1
]}

Borges, BHV

Romero, MA

Morimoto, NI

Neto, LG

机构：

[1] Univ Sao Paulo, Lab Sistemas Integraveis, Escola Politecn, BR-05508900 Sao Paulo, Brazil

[2] Univ Sao Paulo, Dept Engn Eletr, Escola Engn Sao Carlos, BR-13560250 Sao Carlos, SP, Brazil

来源：

IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES | 2002年 / 50卷 / 01期

基金：

巴西圣保罗研究基金会;

关键词：

integrated optics; silicon; waveguides;

D O I：

10.1109/22.981236

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this paper, the design and fabrication of silicon-based optical waveguides are revisited. The goal is to develop a novel design and deposition process to minimize leakage losses. Interface roughness and Si3N4 stoichiometry are examined. The optical loss is measured and contributions from scattering and absorption are determined.

引用

页码：9 / 12

页数：4

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