Investigation of the pulsed electrochemical deposition of ZnO

被引:10
作者
Dunkel, Christian [1 ,2 ]
Luettich, Franziska [3 ]
Graaf, Harald [3 ]
Oekermann, Torsten [2 ]
Wark, Michael [1 ]
机构
[1] Ruhr Univ Bochum, Lab Ind Chem, D-44801 Bochum, Germany
[2] Leibniz Univ Hannover, Inst Phys Chem & Electrochem, D-30167 Hannover, Germany
[3] Tech Univ Chemnitz, Inst Phys, D-09107 Chemnitz, Germany
关键词
Zinc oxide; Electrodeposition; Pulsed electrochemical deposition; ZINC-OXIDE FILMS; THIN-FILMS; CATHODIC ELECTRODEPOSITION; OPTICAL-PROPERTIES; AQUEOUS-SOLUTION; NANOWIRE ARRAYS; CO ALLOYS; DEVICES; GROWTH; SEMICONDUCTOR;
D O I
10.1016/j.electacta.2012.06.113
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The influence of pulse parameters on the morphology of ZnO prepared by pulsed cathodic electrodeposition from oxygen-saturated aqueous ZnCl2 solution on ITO (indium tin oxide)/glass substrates was investigated. It was found that the ratio between the pulse and the pause duration has a crucial influence on the crystal growth, reaching the highest density of the films with pause/pulse-ratios between 0.25 and 1. Longer pauses cause an Ostwald-like ripening of the ZnO crystals and therewith a strong change in the crystal morphology from roundly shaped to hexagonal. Also the hydrophilicity of the substrate resulting from pre-treatment has a crucial influence on the deposited films, leading to films only consisting of few large and separately grown ZnO crystals for highly hydrophilic substrates and an increasing fraction of small densely grown ZnO crystals with increasing hydrophobicity. (C) 2012 Elsevier Ltd. All rights reserved.
引用
收藏
页码:60 / 67
页数:8
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