Hardening process and surface structure of lacquer films studied by x-ray photoelectron spectroscopy

被引:0
作者
Niimura, N [1 ]
Iijima, Y [1 ]
Miyakoshi, T [1 ]
机构
[1] MEIJI UNIV,DEPT IND CHEM,KAWASAKI,KANAGAWA 214,JAPAN
关键词
D O I
10.1002/(SICI)1096-9918(199604)24:4<237::AID-SIA104>3.0.CO;2-C
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The changes of the composition ratios and chemical binding states of the component elements in the surfaces of four varieties of lacquer films during the hardening process were studied by x-ray photoelectron spectroscopy (XPS). Additionally, the relationship between the surface structure and hardening process of lacquer films was studied by the pencil hardness testing method. The relative oxygen contents and the existence ratios among the COO, C=O, C-O-C, C-OOH, C-N and N=O functional groups in the surfaces of the lacquer films increased significantly with the progress of hardening. In addition, it was revealed that a lacquer film with a faster hardening rate showed a higher relative oxygen content and a larger existence ratio among these functional groups in the surface. The increases support the progress of the following three phenomena in the surface of lacquer film during the hardening process, i.e. the concentration of gummy substances and nitrogen-containing compounds, laccase-catalysed oxidative polymerization and autoxidative polymerization.
引用
收藏
页码:237 / 242
页数:6
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