Surface coating of microparticles with tungsten carbide by using the barrel sputtering system

被引:12
作者
Akamaru, Satoshi [1 ]
Yamamoto, Hironari [1 ]
Abe, Takayuki [1 ]
机构
[1] Toyama Univ, Hydrogen Isotope Res Ctr, Toyama 9308555, Japan
关键词
Barrel sputtering system; Coating; Tungsten carbide; Powder;
D O I
10.1016/j.vacuum.2008.04.052
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We studied the coating of microparticles with tungsten carbide using a sputtering system with barrel-type powder sample holder (the barrel sputtering system). In order to find suitable sputtering conditions using the system, tungsten carbide was coated on a glass plate under various desired methane fractions, total pressures and RF powers. According to the XRD analysis on the fabricated films, the desired parameter is attained at a methane fraction of 5%, a total pressure of 1.5 Pa, and an RF power of 100 W Surface coating of polymer microparticles with a WC layer was performed under this condition. Scanning electron microscope and energy-dispersion X-ray spectrum measurement show that the surface of the microparticle is uniformly coated with a thin WC layer. (C) 2008 Elsevier Ltd. All rights reserved.
引用
收藏
页码:633 / 636
页数:4
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