Controlled synthesis of uniform multilayer hexagonal boron nitride films on Fe2B alloy

被引:18
作者
Shi, Zhiyuan [1 ,2 ,3 ]
Lu, Guangyuan [1 ,3 ]
Yang, Peng [4 ]
Wu, Tianru [1 ,3 ]
Yin, Weijun [1 ]
Zhang, Chao [1 ,2 ,3 ]
Jiang, Ren [1 ,5 ]
Xie, Xiaoming [1 ,2 ,3 ,6 ]
机构
[1] Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China
[2] Univ Chinese Acad Sci, Sch Elect Elect & Commun Engn, 19 A Yuquan Rd, Beijing 100049, Peoples R China
[3] CAS Ctr Excellence Superconducting Elect CENSE, Shanghai 200050, Peoples R China
[4] Fudan Univ, State Key Lab ASIC & Syst, Sch Informat Sci & Technol, 220 Handan Rd, Shanghai 200433, Peoples R China
[5] East China Normal Univ, State Key Lab Precis Spect, Sch Phys & Mat Sci, 3663 N Zhongshan Rd, Shanghai 200062, Peoples R China
[6] ShanghaiTech Univ, Sch Phys Sci & Technol, Shanghai 200031, Peoples R China
基金
美国国家科学基金会; 中国博士后科学基金;
关键词
PRESSURE; EMISSION; CRYSTALS;
D O I
10.1039/c9ra00595a
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Two-dimensional (2D) hexagonal boron nitride (h-BN) is highly appreciated for its excellent insulating performance and absence of dangling bonds, which could be employed to maintain the intrinsic properties of 2D materials. However, controllable synthesis of large scale multilayer h-BN is still very challenging. Here, we demonstrate chemical vapor deposition (CVD) growth of multilayer h-BN by using iron boride (Fe2B) alloy and nitrogen (N-2) as precursors. Different from the self-limited growth mechanism of monolayer h-BN on catalytic metal surfaces, with sufficient B source in the bulk, Fe2B alloy promotes the controllable isothermal segregation of multilayer h-BN by reacting with active N atoms on the surface of the substrate. Microscopic and spectroscopic characterizations prove the high uniformity and crystalline quality of h-BN with a highly orientated layered lattice structure. The achievement of large scale multilayer h-BN in this work would facilitate its applications in 2D electronics and optoelectronics in the future.
引用
收藏
页码:10155 / 10158
页数:4
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