Atomic-resolution observation of Hf-doped alumina grain boundaries

被引:29
作者
Yu, Zhiyang [1 ]
Wu, Qian [1 ]
Rickman, Jeffrey M. [1 ]
Chan, Helen M. [1 ]
Harmer, Martin P. [1 ]
机构
[1] Lehigh Univ, Dept Mat Sci & Engn, Ctr Adv Mat & Nanotechnol, Bethlehem, PA 18015 USA
关键词
Grain boundary segregation; Oxidation; High-angle annular dark field (HAADF); Simulation; Multi-dimensional faceting; THERMAL BARRIER COATINGS; INDIVIDUAL DOPANT ATOMS; CREEP RESISTANCE; SEGREGATION; ZR;
D O I
10.1016/j.scriptamat.2013.01.015
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Aberration-corrected high-angle annular dark-field imaging was used to provide atomic-resolution imaging of the Hf distribution within grain boundaries in polycrystalline alumina. In general, the projected image gave the appearance of multiple layers of segregating Hf ions. However, by combining image simulation with the results of through-focus imaging, it was demonstrated that the observations resulted from atomic layer faceting of the grain surface, and that the Hf segregation in each grain was in fact confined to the outermost cation layer. (C) 2013 Published by Elsevier Ltd. on behalf of Acta Materialia Inc.
引用
收藏
页码:703 / 706
页数:4
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