Rectangular Symmetry Morphologies in a Topographically Templated Block Copolymer

被引：26

作者：

Tavakkoli, Amir K. G. ^{[3
,4
]}

Hannon, Adam F. ^{[1
]}

Gotrik, Kevin W. ^{[1
]}

Alexander-Katz, Alfredo ^{[1
]}

Ross, Caroline A. ^{[1
]}

Berggren, Karl K. ^{[2
,4
]}

机构：

[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA

[2] Delft Univ Technol, Kavli Inst Nanosci, Delft, Netherlands

[3] NUS Grad Sch Integrat Sci & Engn NGS, Singapore 117456, Singapore

[4] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA

来源：

ADVANCED MATERIALS | 2012年 / 24卷 / 31期

基金：

美国国家科学基金会;

关键词：

block copolymers; hybrid patterns; templated self-assembly; graphoepitaxy; square patterns; ORDERED SQUARE ARRAYS; LITHOGRAPHY; PATTERNS; ALIGNMENT; POLYMERS; SURFACES;

D O I：

10.1002/adma.201104895

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Using an array of majority-block-functionalized posts makes it possible to locally control the self-assembly of a block copolymer and achieve several morphologies on a single substrate. A template consisting of a square symmetry array of posts produces a square-symmetry lattice of microdomains, which doubles the areal density of features.

引用

页码：4249 / +

页数：7

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