Microstructural investigation of Cu/Co multilayer films

被引:8
|
作者
Larson, DJ [1 ]
Petford-Long, AK [1 ]
Cerezo, A [1 ]
机构
[1] Univ Oxford, Dept Mat, Oxford OX1 3PH, England
来源
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1999年 / 270卷 / 01期
基金
美国国家科学基金会;
关键词
Cu/Co multilayers; focused; giant magnetoresistance; multilayer films; ion-beam milling;
D O I
10.1016/S0921-5093(99)00240-3
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Multilayer film structures, with applications based on the giant-magnetoresistance principle, comprise an exciting area of research and have the capability to improve the storage density and sensitivity of devices used by the magnetic recording industry. In order to optimise the performance of these devices, it is imperative to characterise the atomic-level structural and compositional Variations as a function of processing and operating conditions. A new technique, based on focused ion-beam milling, has been developed to fabricate field-ion specimens from nanometer-scale multilayer films deposited directly onto a planar substrate. This method has allowed field-ion microscopy and three-dimensional atom-probe analysis of this type of structure for the first time. A multilayer thin film structure containing 100 repetitions of a (Cu-2nm/Co-2nm) bilayer showed 5-20% Cu alloying in the cobalt layers, a high degree of layer curvature (particularly at grain boundaries) and regions where several cobalt layers appear to be in contact. These observations suggest a degree of ferromagnetic coupling, which explains the relatively high coercivity measurements obtained from the same Cu/Co films. Films which were annealed for 1 h at 360 degrees C showed an increase in grain size, but little change in other microstructural properties. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:69 / 74
页数:6
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