Negative ion density in inductively coupled chlorine plasmas

被引:49
作者
Hebner, GA
机构
[1] Sandia National Laboratories, Albuquerque
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1996年 / 14卷 / 04期
关键词
D O I
10.1116/1.580040
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Laser photodetachment spectroscopy has been used to infer the density of chlorine negative ions in an inductively coupled chlorine plasma. Time dependent, excess electron density produced by photodetaching electrons from Cl- was detected by a microwave interferometer operating at 80 GHz. By focusing the microwave probe beam through the center of the discharge, negative ion density measurements could be performed in a small, 1.5 cm(3), volume. As the rf power into the plasma increased from 155 to 340 W at 20 mTorr, the Cl- density in the center of the bulk plasma increased from 3.4 to 5.2x10(11) cm(-3). As the pressure was increased from 15 to 50 mTorr at 240 W, the Cl- density increased from 3.5 to 5x10(11) cm(3). Over this parameter space, the negative ion density equaled the electron density to within a factor of 2. The negative ion radial distribution was relatively constant, with a 20% decrease in the center of the plasma for some operating conditions. When the surface of the bias electrode was changed from stainless steel to silicon, the electron density remained constant but the Cl- density decreased by a factor of 2 to 3. (C) 1996 American Vacuum Society.
引用
收藏
页码:2158 / 2162
页数:5
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