Optical properties of Ti-doped ZnO films synthesized via magnetron sputtering

被引：47

作者：

Chen, Haixia ^{[1
]}

Ding, Jijun ^{[2
]}

Shi, Feng ^{[3
]}

Li, Yingfeng ^{[4
]}

Guo, Wenge ^{[1
]}

机构：

[1] Xian Shiyou Univ, Sch Sci, Xian 710065, Shaanxi, Peoples R China

[2] Xi An Jiao Tong Univ, Minist Educ, Elect Mat Res Lab, Key Lab, Xian 710049, Peoples R China

[3] Oregon Inst Technol, Dept Renewable Energy Engn, Klamath Falls, OR 97601 USA

[4] Texas A&M Univ, Dept Elect & Comp Engn, College Stn, TX 77843 USA

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 2012年 / 534卷

关键词：

Ti-doped ZnO films; Magnetron sputtering; Crystal structures; Optical properties; THIN-FILMS; ZINC-OXIDE; SEMICONDUCTOR; DEPOSITION; SUBSTRATE; ENERGY;

D O I：

10.1016/j.jallcom.2012.04.064

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Undoped and Ti-doped ZnO films were deposited using magnetron sputtering at various sputtering power. The crystal structures, surface morphology and optical properties in ZnO films were systematically investigated via X-ray diffraction (XRD), atomic force microscopy (AFM), Jasco V-570 UV/VIS/NIR and ultraviolet visible (UV-Vis) spectrophotometer. The results indicated that Ti-doped ZnO polycrystalline films with a hexagonal wurzite structure formed. Ti-doped ZnO films show more uniform and denser columnar structures with the increase of sputtering power, and a metallic conduction behavior was observed when sputtering powers is increased to 150 and 200 W. One main blue emission peak located at 445 nm was observed. However, blue emission centered at 445 nm continually blue shifted to 438 nm as sputtering power further increased. The shift mechanism of blue emission at different deposited conditions is discussed in detail. Crown Copyright (C) 2012 Published by Elsevier B. V. All rights reserved.

引用

页码：59 / 63

页数：5

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